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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research >Study of frequency-dependent strip admittance in silicon microstrip detectors
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Study of frequency-dependent strip admittance in silicon microstrip detectors

机译:硅微带探测器中随频率变化的条带导纳的研究

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We report on detailed interstrip admittance measurements performed on double-sided, AC-coupled and punch-through biased silicon microstrip detectors. The sensors chosen have been fabricated on very high resistivity substrates, which translates in very low depletion voltages, in the range 10-20 V. This, together with the absence of bias resistors, allows a careful study of the strip admittance components over a wide range of bias voltages and frequencies. In some instances, beyond total depletion the measured interstrip capacitance and dissipation factor exhibit a marked voltage and frequency dependence, linked to the presence of some resistive component. A simple lumped electrical model has been developed to explain the observed features and 3-D numerical simulations have been performed, supporting the interpretation of the phenomena. These features of the admittance have been found to be closely correlated with a non-standard noise term, exhibiting a peculiar frequency/ time dependence, which adds in quadrature to the well known parallel and series noise sources.
机译:我们报告了在双面,交流耦合和穿通偏置硅微带检测器上执行的详细的带间导纳测量。所选传感器是在非常高的电阻率的基板上制造的,其转换的极低的耗尽电压范围为10-20V。这与不存在偏置电阻的情况一起,可以在宽范围内仔细研究带状导纳分量偏置电压和频率范围。在某些情况下,除总损耗外,测得的带间电容和耗散因数还表现出明显的电压和频率依赖性,这与某些电阻性组件的存在有关。已开发出简单的集总电模型来解释观察到的特征,并进行了3-D数值模拟,以支持现象的解释。已经发现导纳的这些特征与非标准噪声项密切相关,表现出独特的频率/时间依赖性,这与众所周知的并联和串联噪声源正交。

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