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Experimental Study of Acceptor Removal in UFSD

机译:UFSD受体去除的实验研究

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摘要

The performance of the Ultra-Fast Silicon Detectors (UFSD) after irradiation with neutrons and protons is compromised by the removal of acceptors in the thin layer below the junction responsible for the gain. This effect is tested both with capacitance-voltage, C-V, measurements of the doping concentration and with measurements of charge collection, CC, using charged particles. We find a perfect linear correlation between the bias voltage to deplete the gain layer determined with C-V and the bias voltage to collect a defined charge, measured with charge collection. An example for the usefulness of this correlation is presented.
机译:用中子和质子照射后的超快速硅探测器(UFSD)的性能受到在负责增益的结下方的薄层中的薄层中的受体受到损害。使用带电粒子的电容 - 电压,C-V,掺杂浓度的测量和测量CC,CC,CC,CC的测量。我们在偏置电压之间发现了耗尽用C-V和偏置电压确定的增益层之间的完美线性相关性,以收集用充电收集测量的限定电荷。提出了这种相关性的有用性的示例。

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