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首页> 外文期刊>Molecular Crystals and Liquid Crystals >Photocurable Polyimide Gate Insulator for Pentacene Thin-Film Transistor With Excellent Chemical Resistance by Low Temperature Processing
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Photocurable Polyimide Gate Insulator for Pentacene Thin-Film Transistor With Excellent Chemical Resistance by Low Temperature Processing

机译:用于耐高温的并五苯薄膜晶体管的光固化聚酰亚胺栅极绝缘子,具有优异的耐化学性

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摘要

We introduce a photo-curable polyimide-based gate insulator for organic thin-film transistors (OTFTs) that allows low-temperature and solution-based processing and provide low leakage current density and high field-effect mobility in devices. Organic gate insulator (PI-TTE) was prepared from a blend of 75.2 wt% hydroxyl group containing polyimide (PI) and 23.8 wt% trimethylolpropane triglycidyl ether as the crosslinker, 0.5 wt% benzoyl peroxide, and 0.5 wt% triphenylsulfonium triflate as the photoacid generator (PAG). PI-TTE showed extremely low leakage current density as 2.33 × 10−10 A/cm2 at 3.3 MV/cm and exhibited a very stable capacitance (96.74 pF/mm2) and it is unchangeable up to 600 hrs. Pentacene TFT using PI-TTE as a gate dielectric showed a field effect mobility as 0.203 cm2/Vs and an on/off ratio of 1.55 × 105 with almost no hysteresis.
机译:我们推出了一种用于有机薄膜晶体管(OTFT)的基于光固化聚酰亚胺的栅极绝缘体,该器件可进行低温和基于溶液的处理,并提供低泄漏电流密度和高场效应迁移率。有机栅绝缘体(PI-TTE)是由75.2 wt%含羟基的聚酰亚胺(PI)和23.8 wt%三羟甲基丙烷三缩水甘油醚作为交联剂,0.5 wt%的过氧化苯甲酰和0.5 wt%的三苯ulf的混合物制备的用三氟甲磺酸作为光致产酸剂(PAG)。 PI-TTE在3.3 MV / cm时表现出极低的泄漏电流密度,为2.33×10 ˆ10 A / cm 2 ,并且具有非常稳定的电容(96.74 pF / mm 2 ),并且在600小时内无法更改。使用PI-TTE作为栅极电介质的并五苯TFT显示场效应迁移率为0.203厘米 2 / Vs和开/关比为1.55×10 5 几乎没有滞后。

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