Nanoprofiles of TiO_2 films deposited by PLD using an evanescent light method

摘要

TiO_2 thin films were deposited by Pulsed Laser Deposition (PLD) on glass substrates at 27℃ and 100℃. The extraction efficiency of evanescent light from the deposited nanolayers and their thickness profiles in the range of (1-100) nm was evaluated using the Differential Evanescent Light Intensity (DELI) imaging method. This optical microscopy technique is based on capturing the evanescent light emitted by the material layer deposited on the substrate. The results were analyzed and discussed in terms of the effective penetration depth parameter. The effective scattering cross-section of the TiO_2 nanometer particles was estimated.