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Device decapsulated (and/or depassivated) - Retest ok - What happened?

机译:设备已解封装(和/或已钝化)-重新测试正常-发生了什么事?

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摘要

One of the very first steps to enter into physical device failure analysis is the device decapsulation. In some cases, an additional depass-ivation follows to give access to contact needles for internal probing. However, it happens from time-to-time that the device has been cured from its failure behaviour. Such cases often end as non-conclusive analysis result. Our principle investigations and results, however, will help to understand the mechanisms and allow in many "hopeless" cases to draw useful conclusions on the root causes. These are linked in most cases to metal related failures. Besides the "classical case" of touching bond wires, typical root causes are metal filament shorts in the nanometer-order-of magnitude, which can be removed easily by mechanical and/or chemical effects of any delayering procedure. Surface metal shorts may also be generated by bump metal or pad-interface-metallisation-redeposition onto the passivation surface and by metal residue-related recombinations of trimming fuses. In both latter cases, nanometer metal films short-circuit neighbouring pads or fuses in trimming-fuse-arrays. This paper describes these and some second-order mechanisms in detail, which sometimes let the chip recover after decapsulation and/or depassivation.
机译:进行物理设备故障分析的第一步就是设备解封装。在某些情况下,需要进行额外的钝化处理,以接触到接触针以进行内部探测。但是,有时会因设备的故障行为而将其治愈。这种情况通常以非结论性分析结果结束。但是,我们的原理研究和结果将有助于理解这种机制,并允许在许多“无希望”案例中从根本原因中得出有用的结论。这些在大多数情况下与金属相关的故障有关。除了接触键合线的“经典情况”之外,典型的根本原因是纳米级数量级的金属丝短路,可以通过任何延迟程序的机械和/或化学作用轻松去除。表面金属短路也可能通过在钝化表面上凸块金属或焊盘界面金属化再沉积以及微调熔丝的与金属残渣有关的重组而产生。在后两种情况下,纳米金属膜都会使微调保险丝阵列中的相邻焊盘或保险丝短路。本文详细描述了这些和一些二阶机制,有时使芯片在解封装和/或钝化后恢复。

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