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首页> 外文期刊>Microelectronics journal >Near-infrared single photon sources employing site-selected InAs/InP quantum dot microcavities
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Near-infrared single photon sources employing site-selected InAs/InP quantum dot microcavities

机译:采用定点InAs / InP量子点微腔的近红外单光子源

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We discuss the design, fabrication and characterisation of optical microcavities suitable for application with single, site-selected InAs/InP quantum dots emitting around λ = 1550 nm. The fabrication procedures that we employ allow high finesse cavities to be constructed around single quantum dots with a known nucleation site and ground state emission energy. Two types of cavity are explored: (ⅰ) pillar cavities in which the quantum dot can be located within the semiconductor spacer layer between two dielectric Bragg reflectors and (ⅱ) photonic bandgap cavities employing textured InP membranes. For 1 μm diameter, SiO_2/Ta_2O_5 pillar cavities we obtain cavity quality factors, Q, of 1500 and for membrane cavities, Q values of 850.
机译:我们讨论了适用于单个,位置选择的InAs / InP量子点(在λ= 1550 nm附近发射)的应用的光学微腔的设计,制造和表征。我们采用的制造程序允许在具有已知成核位点和基态发射能的单个量子点周围构建高精细腔。探索了两种类型的腔:(ⅰ)柱腔,其中量子点可以位于两个介电布拉格反射器之间的半导体间隔层内;以及(ⅱ)使用带纹理的InP膜的光子带隙腔。对于直径为1μm的SiO_2 / Ta_2O_5柱腔,我们获得的腔质量因数Q为1500,而对于膜腔,其Q值为850。

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