Structure and photo-induced features of TiO_2 thin films prepared by RF magnetron sputtering

摘要

TiO_2 thin films were deposited on stainless steel substrates by radio frequency (RF) magnetron sputtering. The process conditions, including RF power, oxygen partial pressure, and temperature of substrate, were varied systematically. The deposited titanium dioxide films consisted of polycrystalline structure with the mixture of anatase and rutile. The average particle diameter of films changed from dozens of nanometers to hundreds of nanometers. It was found that the conditions, 200 W RF power, 90% oxygen partial pressure, and 673 K temperature of substrate, were optimal to deposit a TiO_2 thin film with good photocatalytic activity and photo-induced hydrophilicity that will be attributable to their higher content of anatase.