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Structure of hydrogen gas sensing TiO_2 thin films prepared by sol - gel method and their comparison with magnetron sputtered films

机译:溶胶 - 凝胶法制备的氢气感应TiO_2薄膜的结构及其与磁控溅射膜的比较

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TiO_2 thin films with a thickness of about 150 nm were deposited by spin coating method on sapphire substrate from a sol-gel system. The hydrogen sensing properties of TiO_2 films annealed at various temperatures were studied and correlated with their structure, optical and electrical properties. The annealing temperatures in the range of 600 - 800 °C lead to anatase films with a roughness in the range of 0.6 - 0.9 nm. Their sensitivity towards hydrogen is low. The thin films annealed at temperatures in the range 900 - 1000 °C consist of rutile phase and their roughness increased to 11.7 - 13.5 nm. They showed good hydrogen sensitivity with optimal operating temperature 200 - 250 °C. The structure and sensing properties of the prepared films are compared with those synthesized with magnetron sputtering. The maximum of sensitivity was measured on the thin films with diameter of the grains about 100 nm in both cases, i.e. on thin films prepared by sol-gel method as well as on thin films prepared by magnetron sputtering. The maximum sensitivity correlates with the diameter of the grains and don't depend on the allotropy of the titanium dioxide - anatase or rutile.
机译:通过溶凝胶系统对蓝宝石底物的旋涂法沉积厚度约150nm的TiO_2薄膜。研究了在各种温度下退火的TiO_2薄膜的氢感特性,并与其结构,光学和电性能相关。在600-800℃的退火温度范围内导致锐钛矿膜,粗糙度在0.6-0.9nm的范围内。他们对氢的敏感性很低。在900-1000℃的温度下退火的薄膜由金红石相组成,它们的粗糙度增加至11.7-13.5nm。它们显示出良好的氢气灵敏度,最佳工作温度200-250°C。将制备薄膜的结构和感测性能与用磁控溅射合成的结构进行比较。在两种情况下,在晶粒直径约100nm的薄膜上测量最大灵敏度,即在溶胶 - 凝胶法制备的薄膜上以及通过磁控溅射制备的薄膜。最大敏感性与晶粒的直径相关,不依赖于二氧化钛 - 锐钛矿或金红石的各种情况。

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