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首页> 外文期刊>Microelectronics journal >Analytical modeling for 3D potential distribution of rectangular gate (RecG) gate-all-around (GAA) MOSFET in subthreshold and strong inversion regions
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Analytical modeling for 3D potential distribution of rectangular gate (RecG) gate-all-around (GAA) MOSFET in subthreshold and strong inversion regions

机译:亚阈值和强反转区域中的矩形栅极(RecG)全方位栅(GAA)MOSFET的3D电势分布的解析模型

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摘要

In this paper, we have introduced an analytical subthreshold and strong inversion 3D potential model for rectangular gate (RecG) gate-all-around (GAA) MOSFET. The subthreshold and strong inversion potential distribution in channel region of a RecG MOSFET is obtained respectively by solving 3D Laplace and 3D Poisson equations. The assumed parabolic potential distribution along the z-axis in channel direction is appropriately matched with 3D device simulator after consideration of z-depended characteristic length in subthreshold region. For accurate estimation of short channel effects (SCE), the electrostatics near source and drain is corrected. The precise gate-to-gate potential distribution is obtained after consideration of higher order term in assumed parabolic potential profile. The model compares well with numerical data obtained from the 3D ATLAS as a device simulator and deckbuild as an interactive runtime of Silvaco Inc.
机译:在本文中,我们介绍了用于矩形栅极(RecG)环型栅极(GAA)MOSFET的亚阈值分析和强反转3D势模型。通过求解3D Laplace和3D Poisson方程,分别获得RecG MOSFET沟道区域中的亚阈值和强反转电位分布。在考虑了亚阈值区域中依赖于z的特征长度之后,使用3D设备模拟器对沿通道方向沿z轴的假定抛物线电位分布进行了适当匹配。为了准确估计短沟道效应(SCE),需要校正源极和漏极附近的静电。在假定抛物线电势曲线中考虑了高阶项后,即可获得精确的门到门电势分布。该模型与从3D ATLAS获得的数值数据进行了很好的比较,3D ATLAS作为设备仿真器,deckbuild作为Silvaco Inc.的交互式运行时。

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