机译:可变形状的电子束光刻技术可为未来的铜镶嵌技术开发工艺
Fraunhofer Center Nanoelectronic Technologies (Fraunhofer CNT). D-01099 Dresden, Germany;
Fraunhofer Research Institution for Electronic Nano Systems (Fraunhofer ENAS). D-09126 Chemnitz, Germany;
Fraunhofer Center Nanoelectronic Technologies (Fraunhofer CNT). D-01099 Dresden, Germany;
TV Chemnitz, Center for Microtechnologies, D-09107 Chemnitz. Germany;
Fraunhofer Center Nanoelectronic Technologies (Fraunhofer CNT). D-01099 Dresden, Germany;
Fraunhofer Research Institution for Electronic Nano Systems (Fraunhofer ENAS). D-09126 Chemnitz, Germany;
Fraunhofer Center Nanoelectronic Technologies (Fraunhofer CNT). D-01099 Dresden, Germany;
Fraunhofer Research Institution for Electronic Nano Systems (Fraunhofer ENAS). D-09126 Chemnitz, Germany TV Chemnitz, Center for Microtechnologies, D-09107 Chemnitz. Germany;
Fraunhofer Center Nanoelectronic Technologies (Fraunhofer CNT). D-01099 Dresden, Germany;
Fraunhofer Center Nanoelectronic Technologies (Fraunhofer CNT). D-01099 Dresden, Germany;
Fraunhofer Research Institution for Electronic Nano Systems (Fraunhofer ENAS). D-09126 Chemnitz, Germany TV Chemnitz, Center for Microtechnologies, D-09107 Chemnitz. Germany;
Fraunhofer Center Nanoelectronic Technologies (Fraunhofer CNT). D-01099 Dresden, Germany;
e-beam; ebdw; copper interconnects; airgaps; beol;
机译:纳米图形高能电子束光刻的仿真-电子束光刻模拟器的发展
机译:纳米图形高能电子束光刻的仿真-电子束光刻模拟器的发展
机译:基于自组装在云母上的氧化钨纳米棒的金纳米线触点的电子束光刻工艺开发
机译:通过大规模并行电子束检测的发展为未来的掩模技术提供检测解决方案
机译:电迁移增强了无铅焊点中铜-锡金属间化合物的动力学,并使用分步和闪光压印光刻技术进行了铜低k双大马士革工艺。
机译:用于金纳米阵列制造和在纳米技术中使用的高速电子束光刻
机译:用于金纳米阵列制造的高速电子束光刻和在纳米技术中的应用