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Multi-variable thermal design of T-structured phase-change memory cell using advanced response surface method

机译:使用高级响应面法的T型相变存储单元多变量热设计

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摘要

Thermal design is crucial in designing phase-change memory (PCM) as it is operated by thermal energy. Among the numerous factors that influence the performance of PCM, geometrical configuration is the most critical factor as the heat confinement is determined by the effective thermal resistance of the PCM cell. This study reports the thermal design of T-structured PCM cell with contact diameter of 80 nm. Five design variables, which are the thicknesses of two metal contact layers, two metal electrode layers, and one phase-change layer, are studied. Cell performance is evaluated in terms of the highest cell temperature during the reset process. The performance results of the five variables are correlated into a single equation using the advanced response surface method, which is a modified form of conventional response surface method. By doing this, one can easily design and define the PCM with the best performance under given constraints. Given design ranges, results show that the cell performance is maximum when the two top metal layers and the bottom metal electrode become thinner while the bottom metal contact becomes thicker. However, there exists a certain phase-change layer thickness, which is 36 nm in this study, for the maximum performance to occur.
机译:热设计在设计相变存储器(PCM)时至关重要,因为它是由热能驱动的。在影响PCM性能的众多因素中,几何构型是最关键的因素,因为热限制取决于PCM单元的有效热阻。这项研究报告了接触直径为80 nm的T型PCM单元的热设计。研究了五个设计变量,即两个金属接触层,两个金属电极层和一个相变层的厚度。根据复位过程中的最高电池温度评估电池性能。使用高级响应面方法将五个变量的性能结果关联到一个方程式中,该方法是常规响应面方法的一种改进形式。通过这样做,可以轻松设计和定义在给定约束下具有最佳性能的PCM。给定设计范围,结果表明,当两个顶部金属层和底部金属电极变薄而底部金属触点变厚时,电池性能最佳。但是,为了达到最佳性能,存在一定的相变层厚度(在本研究中为36 nm)。

著录项

  • 来源
    《Microelectronic Engineering》 |2012年第3期|p.1-8|共8页
  • 作者单位

    Department of Mechanical Engineering, Yonsei University, Seoul 120-749, Republic of Korea;

    Department of Mechanical Engineering, Yonsei University, Seoul 120-749, Republic of Korea;

    Department of Mechanical Engineering, Yonsei University, Seoul 120-749, Republic of Korea;

    Department of Mechanical Engineering, Yonsei University, Seoul 120-749, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    phase-change memory device; thermal design; advanced response surface method;

    机译:相变存储设备;热设计;高级响应面法;

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