机译:单独使用涡流法现场测量CMP过程中的Cu膜厚度
State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China;
State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China;
State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China;
State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China;
State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China;
State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China;
State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China;
Eddy current method; Chemical mechanical polishing; Cu film thickness;
机译:在集成电路(IC)制造过程中多层互连的顶部Cu膜厚度的涡流测量
机译:集成电路制造过程中多层互连的顶层铜膜厚度的涡流测量
机译:提高涡流传感器对铜膜纳米级厚度测量的灵敏度
机译:使用涡流传感器监测CMP过程中的铜层厚度
机译:实时原位化学传感,基于传感器的膜厚计量和W-CVD工艺中的工艺控制。
机译:通过DUV辅助溶液沉积工艺制备的YBa2Cu3O7-x超导膜的高临界电流密度
机译:基于涡流传感和距离跟踪技术的金属薄膜非接触式在线厚度测量系统