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A Novel Method of Analytical Transmission Electron Microscopy for Measuring Highly Accurately Segregation to Special Grain Boundaries or Planar Interfaces

机译:一种分析透射电子显微镜的新方法,用于测量与特定晶界或平面界面的高精度偏析

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摘要

A new technique of analytical transmission electron microscopy has been developed for determining accurately the amount of solute atoms incorporated into well-defined planar defects in solids, such as stacking faults, special grain boundaries or interfaces. The method is based on recording series of analytical spectra taken with different electron beam diameters on the same position centred above a defect that is oriented nearly edge-on. The matrix/solute ratio is then plotted as a function of the electron beam radius, linear regression is performed and the segregation level is determined from the slope of the best fit. This method can be applied to energy-dispersive X-ray (EDX) or electron energy-loss spectroscopy (EELS) in a transmission electron microscope. It necessitates a nano-probe mode but no scan unit. Reliability and accuracy have been tested numerically. Simulations suggest an accuracy in the determination of the Gibbsian solute excess at a special grain boundary down to ±0.1 atoms nm−2 under typical experimental conditions, with a maximum error about twice as large.
机译:已经开发出一种分析透射电子显微镜的新技术,用于准确确定固溶到固体中明确定义的平面缺陷(例如堆垛层错,特殊晶界或界面)中的溶质原子的数量。该方法基于记录一系列分析光谱,这些分析光谱是在同一位置上以不同的电子束直径拍摄的,该位置居中位于几乎接近边缘的缺陷上方。然后将基体/溶质比作为电子束半径的函数作图,进行线性回归,并从最佳拟合的斜率确定偏析水平。该方法可以应用于透射电子显微镜中的能量色散X射线(EDX)或电子能量损失谱(EELS)。它需要纳米探针模式,但没有扫描单元。可靠性和准确性已通过数值测试。仿真结果表明,在典型的实验条件下,在特定的晶界(低至±0.1个原子nm-2 )处,吉布斯溶质过量的测定精度较高,最大误差约为前者的两倍。

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