Sematech aims spotlight at breakthrough technology for spotting litho projection lens aberrations )

摘要

Atechnology developed initially for shooting down missiles may prove effective for troubleshooting problems with lenses used in advanced lithography. International Sematech has begun examining two tools that use the technology, which was developed by Litel Instruments of San Diego. The systems enable operators to characterize aberrations in the projection lenses for steppers and scanners.