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Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

机译：平移对称交替移相掩模光栅标记在光刻投影像差线性测量模型中的应用

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Zicheng Qiu Xiangzhao Wang Qunyu Bi Qiongyan Yuan Bo Peng Lifeng Duan;
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年度 2009
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入库时间 2022-08-20 20:55:52

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1. Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations [J] . Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Applied optics . 2009,第19期

机译：平移对称交替移相掩模光栅标记在光刻投影像差线性测量模型中的应用
2. Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image [J] . Bo Peng, Xiangzhao Wang, Zicheng Qiu, Applied optics . 2010,第15期

机译：基于交替相移掩模图像中相邻峰的强度差的光刻投影光学器件的均匀像差测量
3. Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask [J] . Fan Wang, Xiangzhao Wang, Mingying Ma, Applied Optics . 2006,第2期

机译：使用交替相移掩模在光刻工具中测量投影光学器件的像差
4. ABERRATION MEASUREMENT OF PROJECTION OPTICS IN LITHOGRAPHIC TOOLS BY USE OF PHASE-SHIFTED GRATING MARKS [C] . Mingying Ma, Xiangzhao Wang, Zicheng Qiu, International Conference on Semiconductor Technology . 2007

机译：通过使用相移光栅标记的光刻工具中投射光学器件的像差测量
5. Measuring aberrations in lithographic projection systems with phase wheel targets. [D] . Zavyalova, Lena. 2010

机译：使用相位轮靶测量光刻投影系统中的像差。
6. Phase-Shifted Eccentric Core Fiber Bragg Grating Fabricated by Electric Arc Discharge for Directional Bending Measurement [O] . Yang Ouyang, Jianxia Liu, Xiaofeng Xu, 2018

机译：电弧放电制造的用于相向弯曲测量的相移偏心纤芯布拉格光栅
7. Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations [O] . Zicheng Qiu, 1, 2 Xiangzhao Wang, 2009

机译：平移对称交替移相掩模光栅标记在光刻投影像差线性测量模型中的应用
8. Concept Study of a Multiple Beam Lens Antenna with an Internal Phase Shift Mask [R] . McGrath, D. T. 1985

机译：具有内置相移掩模的多光束透镜天线的概念研究

Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

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