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首页> 外文期刊>Micro & Nano Letters, IET >Design of CMOS-MEMS broadband infrared emitter arrays integrated with metamaterial absorbers based on CMOS back-end-of-line
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Design of CMOS-MEMS broadband infrared emitter arrays integrated with metamaterial absorbers based on CMOS back-end-of-line

机译:基于CMOS后端与超材料吸收剂集成的CMOS-MEMS宽带红外发射器阵列的设计

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摘要

A new design of complementary metal-oxide-semiconductor microelectromechanical systems (CMOS-MEMS) broadband infrared (IR) emitter arrays with integrated metamaterial absorbers (MAs) developed by the CMOS back-end-of-line is presented. The IR emitter array is a promising broadband thermal radiation source for integrated gas sensors. Novel IR emitter arrays are designed using the Central Semiconductor Manufacturing Corporation 0.5 μm 2-poly-3-metal CMOS process. To improve the low emissivity that is commonly seen in CMOS-MEMS type IR emitters due to the inherited low emissivity of SiO2 and SiN in CMOS process, we newly adopted tri-layer metal-insulator-metal (MIM) and four-layer insulator-MIM (IMIM) MA by using the CMOS back-end metal layers and inter-layer dielectrics, thereby to excite multi-mode surface plasmon polariton resonances. The emitter integrated with IMIM MA can be electrically modulated up to 344 Hz, as theoretically predicated from thermal properties of the emitters and the radiation properties calculated based on Planck's radiation law. Simulated emissivity spectra through FEM show that the multi-mode resonances in CMOS MIM and IMIM MAs enhance emissivity and broaden the waveband effectively.
机译:提出了一种新型的互补金属氧化物半导体微机电系统(CMOS-MEMS)宽带红外(IR)发射器阵列,该阵列具有由CMOS后端开发的集成超材料吸收器(MA)。红外发射器阵列是用于集成气体传感器的有前途的宽带热辐射源。新型IR发射器阵列是使用中央半导体制造公司的0.5μm2-poly-3-metal CMOS工艺设计的。由于CMOS工艺中SiO2和SiN继承了低发射率,为了改善CMOS-MEMS型红外发射器中常见的低发射率,我们新采用了三层金属-绝缘体-金属(MIM)和四层绝缘体- MIM(IMIM)MA通过使用CMOS后端金属层和层间电介质,从而激发多模表面等离振子极化共振。从理论上根据发射器的热特性和根据普朗克辐射定律计算出的辐射特性可以预测,与IMIM MA集成在一起的发射器可以进行高达344 Hz的电调制。通过有限元模拟的发射率谱表明,CMOS MIM和IMIM MA中的多模谐振可提高发射率并有效地扩展波段。

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