X-ray and optical interferometry is applied to the measurement of silicon lattice spacing. The previously reported standard deviation 0.16 x 10~-6 has been reduced to 0.05 x 10~-6. the d(220) is 192015.593(0.01) fm after correction of lattice strain by carbon and oxygen.
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机译：X射线和光学干涉术被应用于硅晶格间距的测量。先前报告的标准偏差0.16 x 10〜-6已减小至0.05 x 10〜-6。经碳和氧校正晶格应变后，d（220）为192015.593（0.01）fm。
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