首页> 外文期刊>Metallurgical and Materials Transactions A >Growth and Characterization of GaN Nanowires by NiCl2 Assisted Chemical Vapor Deposition
【24h】

Growth and Characterization of GaN Nanowires by NiCl2 Assisted Chemical Vapor Deposition

机译:NiCl 2 辅助化学气相沉积法生长和表征GaN纳米线

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Large-scale, high-density GaN nanowires were successfully synthesized on Si(111) substrates by the NiCl2 assisted chemical vapor deposition (CVD) method, and their composition, microstructure, morphology, and optical properties were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscope (XPS), fourier transform infrared spectrophotometer (FTIR), scanning electron microscope (SEM), high-resolution transmission electron microscope (HRTEM), and photoluminescence (PL). The results demonstrate that the nanowires are single-crystal GaN with hexagonal wurtzite structure having the size of 20 to 50 nm in diameter with some nanodroplets on their tips, which reveals that the growth mechanism of GaN nanowires agrees with the vapor-liquid-solid (VLS) process. Two first-order Raman active phonon bands move to low shift and E2 (high) and A1(LO) bands broaden, which is caused by size effect.
机译:NiCl 2 辅助化学气相沉积(CVD)方法在Si(111)衬底上成功合成了大规模,高密度的GaN纳米线,其组成,微观结构,形貌和光学性能均达到了由X射线衍射(XRD),X射线光电子能谱仪(XPS),傅立叶变换红外分光光度计(FTIR),扫描电子显微镜(SEM),高分辨率透射电子显微镜(HRTEM)和光致发光(PL)表征。结果表明,纳米线是具有六方纤锌矿结构的单晶GaN,直径为20至50 nm,尖端上具有一些纳米液滴,这表明GaN纳米线的生长机理与气液固相一致( VLS)过程。两个一阶拉曼有源声子带移至低频,E 2 (高)和A 1 (LO)带变宽,这是由于尺寸效应引起的。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号