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INDIUM PLATING

机译:铟镀层

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摘要

Indium is the only trivalent metal that can readily be electrodeposited from a cyanide solution. Solution make-up and operational parameters are summarized in Table I. Indium hydroxide [In(OH)_3] is first prepared by the precipitation of indium chloride (InCl_3) using ammonium hydroxide or sodium hydroxide. The purified and dried In(OH)_3 is then dissolved in an alkaline cyanide solution stabilized with a sugar such as D-glucose, dextrose, or sorbitol. The cyanide bath is used in applications demanding extremely high throwing power and adhesion. Deposits are uniform and bright matte in appearance. Since this a high pH bath, it had the disadvantage of requiring the use of insoluble anodes, necessitating replenishment in the form of an indium cyanide concentrate. Its cathode efficiency is initially 90%, but upon bath aging decreases from this value to 50-75%. Periodic determination of the plating rate is thus required.
机译:铟是唯一易于从氰化物溶液中电沉积的三价金属。溶液组成和操作参数总结在表I中。氢氧化铟[In(OH)_3]首先是通过使用氢氧化铵或氢氧化钠沉淀氯化铟(InCl_3)制备的。然后将纯化并干燥的In(OH)_3溶解在用糖(例如D-葡萄糖,右旋糖或山梨糖醇)稳定的碱性氰化物溶液中。氰化物浴用于要求极高的投射力和附着力的应用中。沉积物外观均匀且光亮。由于该高pH浴,其缺点是需要使用不溶性阳极,必须以氰化铟浓缩物的形式补充。其阴极效率最初为90%,但在镀液老化后,该值将从该值降至50-75%。因此需要定期确定镀覆速率。

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