Aqueous indium or indium alloy plating bath, and method of depositing indium or indium alloy

摘要

An aqueous indium or indium alloy plating bath, Indium ion source, acid, halide ion source, formula (I) with a surfactant wherein, A is a branched or unbranched C ₁₀ -C ₁₅ - is selected from alkyl, B is hydrogen and Selected from the group consisting of alkyl, m is an integer ranging from 5 to 25, and each R is independently selected from hydrogen and methyl, and dihydroxybenzene derivatives according to formula (II) [ Wherein each X is independently selected from fluorine, chlorine, bromine, iodine, alkoxy, and nitro, and n is an integer in the range of 1-4. An aqueous indium or indium alloy plating bath, and a method of depositing indium or indium alloy in which the bath is used.