Method for depositing an aqueous indium or indium alloy plating bath and indium or indium alloy

摘要

An aqueous indium or indium alloy plating bath comprising: - source of indium ion, - Mountain, A source of halide ions, Surfactants according to formula (I) (I) Wherein A is selected from branched or unbranched C ₁₀ -C ₁₅ alkyl; B is selected from the group consisting of hydrogen and alkyl; m is an integer ranging from 5 to 25; Each R is independently selected from hydrogen and methyl; And - dihydroxybenzene derivatives according to formula (II) (II) Wherein each X is independently selected from fluorine, chlorine, bromine, iodine, alkoxy and nitro; n is an integer ranging from 1 to 4, And depositing an indium or indium alloy in which the bath is used.