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Growth and Transport properties of Sr-doped Lanthanum Titanate Thin Films on LaAlO_3

机译:LaAlO_3上掺锶钛酸镧薄膜的生长和传输性能

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Sr-doped LaTiO_3 (SLTO) thin epitaxial films on LaAlO_3 (100) have been fabricated by the off-axis rf magnetron co-sputtering system. The dopant Sr~(2+) ions were expected substituting La~(3+) ions in the films to introduce the hole carriers. The X-ray diffraction shows that the [001] direction of the SLTO films is perpendicular to the substrate surface. The in-situ grown specimens were measured the temperature dependence of resistivity and the Hall coefficients to study the transport properties. The Hall measurements show that the carrier is electron for Sr-doping over 16%. The temperature dependence of the resistance shows that the n-type films are metallic and deviate from free electron gas model obviously. We found the behaviour could be well described by the small-polaron coherent motion model.
机译:LaAlO_3(100)上的掺Sr的LaTiO_3(SLTO)外延薄膜是通过离轴射频磁控共溅射系统制造的。预期掺杂剂Sr〜(2+)离子会取代薄膜中的La〜(3+)离子以引入空穴载流子。 X射线衍射表明SLTO膜的[001]方向垂直于基底表面。测量原位生长的样品的电阻率和霍尔系数的温度依赖性,以研究其输运性能。霍尔测量结果表明,用于Sr掺杂的载流子是电子,超过16%。电阻的温度依赖性表明,n型膜是金属的,明显偏离了自由电子气模型。我们发现该行为可以由小极化子相干运动模型很好地描述。

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