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Effects of Pulsed and DC Body-Diode Current Stress on the Stability of 1200-V SiC MOSFET I-V Characteristics

机译:脉冲和直流体二极管电流应力对1200V SiC MOSFET I-V特性的稳定性的影响

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摘要

1,200-V and 1,700-V SiC power MOSFETs from multiple suppliers were subject to dc and pulsed-current stress of the body-diode. Three of the five suppliers of 1,200-V devices evaluated showed no significant bipolar degradation, but the other two supplier's devices showed varying degrees of degradation due this bipolar phenomenon. Electrical results of newly released 1,700-V devices from two suppliers showed significant degradation in the body-diode and MOSFET I-V characteristics following both dc and pulsed-current stress of their body-diodes. The electrical results presented in this work are consistent with basal plane dislocations (BPDs) that form stacking faults during forward conduction of the body-diode. Significant drift in the body-diode forward voltage and MOSFET on-resistance indicates that a much higher BPD density may be present in 1,700-V devices in comparison to the more mature 1,200-V device offerings. The likely presence of BPDs can lead to significant reliability issues in some modern SiC power MOSFETs, and their distribution seems to vary across suppliers and among devices with the same rating and from the same supplier. These differences are likely due to variations in wafer and device processing among suppliers and within a given product line from a single supplier.
机译:来自多个供应商的1,200-V和1,700V SiC功率MOSFET受到体二极管的直流和脉冲电流应力。评估的1,200V设备的五个供应商中的三个显示出没有明显的双极退化,但其他两个供应商的设备显示出由于这种双极现象而变化的降解程度。来自两个供应商的新释放的1,700V设备的电气结果在DC和它们的身体二极管的脉冲 - 电流应力之后的体二极管和MOSFET I-V特性中的显着降解。本作作品中呈现的电气结果与基底平面脱位(BPD)一致,其在体二极管前向前传导期间形成堆叠故障。主体二极管正向电压和MOSFET导通电阻的显着漂移表明,与更成熟的1,200V器件产品相比,1,700-V设备中可以存在更高的BPD密度。 BPD的可能存在可能导致一些现代SIC电源MOSFET中的显着可靠性问题,它们的分布似乎因供应商和具有相同评级和同一供应商的设备而异。这些差异可能是由于供应商之间的晶片和设备处理的变化以及来自单个供应商的给定产品线。

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