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Chromium oxides thin films prepared and coated in situ with gold by pulsed laser deposition

机译:通过脉冲激光沉积制备并原位镀金的氧化铬薄膜

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Chromium dioxide is a very suitable compound for spintronic devices. It is ferromagnetic at room temperature (T_c = 395 K) and has a half-metallic band structure. CrO_2 has been theoretically predicted to be100 percent spin polarized at the Fermi level. For some applications in spintronics low deposition temperatures are required. However, the fabrication of single phase thin films of CrO_2 at low temperature is quite difficult due to its metastable character. In this work we report our experiments to deposit thin films of chromium oxides by reactive pulsed laser deposition (RPLD). RPLD experiments were performed with a UV KrF excimer laser source (PIN_(FWHM) > = 20 ns, lambda = 248 nm) in different conditions regarding the target, the substrate temperature, the atmosphere inside the deposition chamber and the laser fluence. In order to prevent the reduction of CrO_2 to Cr_2O_3 in thin films preserved in ambient conditions some of the samples were capped with gold in situ using the same set-up. The composition and morphology of the deposited films were characterized by X-ray diffraction, scanning electron microscopy and Raman spectroscopy. A higher and stable content of CrO_2 in the deposited films was evidenced in the case of samples capped with Au. Subsequent analysis performed after 4 months showed no difference in the content of the film.
机译:二氧化铬是非常适合自旋电子设备的化合物。它在室温下(T_c = 395 K)是铁磁性的,具有半金属能带结构。从理论上讲,CrO_2是费米能级的100%自旋极化。对于自旋电子学中的某些应用,需要低沉积温度。然而,由于CrO_2的亚稳态特性,在低温下制备CrO_2单相薄膜非常困难。在这项工作中,我们报告了通过反应脉冲激光沉积(RPLD)沉积氧化铬薄膜的实验。 RPLD实验是使用UV KrF准分子激光源(PIN_(FWHM)> = 20 ns,λ= 248 nm)在不同条件下进行的,涉及目标,基板温度,沉积室内的气氛和激光通量。为了防止在环境条件下保存的薄膜中CrO_2还原为Cr_2O_3,某些样品使用相同的装置原位覆盖了金。通过X射线衍射,扫描电子显微镜和拉曼光谱对沉积膜的组成和形态进行表征。在用Au覆盖的样品中,可以证明沉积膜中CrO_2的含量较高且稳定。 4个月后进行的后续分析表明膜的含量没有差异。

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