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Study of space charge in gallium nitride by the thermal step method

机译:热步法研究氮化镓中的空间电荷

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In this paper, we report the electric investigation of thin nitride gallium films by the capacitance voltage technique and the thermal step method (TSM). The C-V analysis at 1 MHz of Au/GaN diode reveals MOS behaviour and shows strong capacitance hysteresis. This may be due to the presence of trapped charge in this structure. The space charge dynamics is studied by thermal step method at different applied voltages. The TS currents are reverted from negative ones to positive ones above inversion threshold of +0.2 V. This change corresponds to charge modulation from accumulation to the inversion one, in good agreement with the C-V characteristics. The stored charge in this sample is related to the nature of gallium nitride and to the manufacturing processes. The results confirm the possibility to apply the TSM for the measurement of the space charge in the semiconductor materials.
机译:在本文中,我们通过电容电压技术和热步进法(TSM)报道了氮化镓薄膜的电学研究。 Au / GaN二极管在1 MHz处的C-V分析揭示了MOS行为并显示出很强的电容滞后。这可能是由于在此结构中存在捕获的电荷。通过热阶跃方法研究了不同施加电压下的空间电荷动力学。 TS电流从高于+0.2 V的反向阈值的负电流恢复为正电流。此变化对应于电荷从累积到反向的调制,与C-V特性非常吻合。该样品中存储的电荷与氮化镓的性质以及制造工艺有关。结果证实了将TSM应用于半导体材料中空间电荷的测量的可能性。

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