...
机译:大气压CVD沉积SnO_2:FTCO薄膜制成的非晶硅太阳能电池
IEF5-Photovoltaik. Forschungszentrum Juelich, 52425 Juelich, Germany;
IEF5-Photovoltaik. Forschungszentrum Juelich, 52425 Juelich, Germany;
IEF5-Photovoltaik. Forschungszentrum Juelich, 52425 Juelich, Germany;
Institute for Materials Research, University of Salford, Manchester M5 4WT, UK;
Institute for Materials Research, University of Salford, Manchester M5 4WT, UK;
Institute for Materials Research, University of Salford, Manchester M5 4WT, UK CVD Technologies Ltd., Cockroft Building, Manchester M5 4WT, UK;
Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i. Cukrovarnicka 10, CZ-16253, Prague, Czech Republic;
Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i. Cukrovarnicka 10, CZ-16253, Prague, Czech Republic;
TCO; solar cells; APCVD; PECVD;
机译:高效的氮化硅SINX:H抗反射和钝化层,用于硅太阳能电池的大气压PECVD沉积
机译:通过HWCVD以超高沉积速率沉积的非晶硅膜和太阳能电池
机译:O_2,N_2流量和沉积时间对通过大气压化学气相沉积(APCVD)沉积的SnO_2薄膜的结构,电学和光学性质的依赖性
机译:具有薄无定形硅膜的双相异性结构,通过热线CVD沉积在晶体硅上进行太阳能电池应用
机译:大气压等离子体CVD工艺的设计,该工艺使用介电势垒放电沉积氮化硅薄膜。
机译:通过PECVD在镍金属化多孔硅上沉积的非晶硅薄膜的结晶
机译:氢化非晶硅薄膜作为钝化层,用于杂交偏光PECVD用于异质结太阳能电池