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首页> 外文期刊>Materials Science and Engineering >Interfacial microstructure of Si_3N_4/Si_3N_4 brazing joint with Cu-Zn-Ti filler alloy
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Interfacial microstructure of Si_3N_4/Si_3N_4 brazing joint with Cu-Zn-Ti filler alloy

机译:Si_3N_4 / Si_3N_4与Cu-Zn-Ti钎料的钎焊界面组织

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摘要

In this study, Si_3N_4 ceramic was jointed by a brazing technique with a Cu-Zn-Ti filler alloy. The interfacial microstructure between Si_3N_4 ceramic and filler alloy in the Si_3N_4/Si_3N_4 joint was observed and analyzed by using electron-probe microanalysis, X-ray diffraction and transmission electron microscopy. The results indicate that there are two reaction layers at the ceramic/filler interface in the joint, which was obtained by brazing at a temperature and holding time of 1223 K and 15 min, respectively. The layer nearby the Si_3N_4 ceramic is a TiN layer with an average grain size of 100 nm, and the layer nearby the filler alloy is a Ti_5Si_3N_x layer with an average grain size of 1-2 μm. Thickness of the TiN and Ti_5Si_3N_x layers is about 1 |xm and 10 u-m, respectively. The formation mechanism of the reaction layers was discussed. A model showing the microstructure from Si_3N_4 ceramic to filler alloy in the Si_3N_4/Si_3N_4 joint was provided as: Si_3N_4 ceramic/TiN reaction layer/Ti_5Si_3N_x reaction layer/Cu-Zn solution.
机译:在这项研究中,Si_3N_4陶瓷通过钎焊技术与Cu-Zn-Ti填充合金结合在一起。通过电子探针显微分析,X射线衍射和透射电子显微镜观察并分析了Si_3N_4 / Si_3N_4接头中Si_3N_4陶瓷与填充合金之间的界面微观结构。结果表明,在接头的陶瓷/填料界面处有两个反应层,这是通过分别在1223 K和15分钟的温度和保持时间下进行钎焊获得的。 Si_3N_4陶瓷附近的层是平均粒径为100 nm的TiN层,填充合金附近的层是平均粒径为1-2μm的Ti_5Si_3N_x层。 TiN和Ti_5Si_3N_x层的厚度分别约为1 | xm和10 u-m。讨论了反应层的形成机理。提供了表示Si_3N_4 / Si_3N_4接头中从Si_3N_4陶瓷到填充合金的微观结构的模型,该模型为:Si_3N_4陶瓷/ TiN反应层/ Ti_5Si_3N_x反应层/ Cu-Zn溶液。

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