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C-axis-oriented Bi_(3.25)La_(0.75)Ti_3O_(12) ferroelectric thin film fabricated by chemical solution deposition

机译:化学溶液沉积法制备C轴取向Bi_(3.25)La_(0.75)Ti_3O_(12)铁电薄膜

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摘要

C-axis-oriented Bi_(3.25)La_(0.75)Ti_3O_(12) (BLT) ferroelectric thin films were successfully prepared by chemical solution deposition. According to X-ray diffraction, it is found that the orientation degree increases with the increase of sintering temperature, and at the same time the grain morphology changes from equiaxed to plate-like. Due to the dense morphology and [Bi_2O_2]~(2+) layer of c-preferred orientation of BLT film sintered at 650℃, it exhibits the lowest leakage current density at room temperature. Additionally, a linear relation between V~(0.5) and log(J/T~2) is found, suggesting the behavior of leakage current of BLT films obeys the Schottky emission model. P-E loops show that the c-axis-oriented BLT ferroelectric film exhibits low polarization and small coercive field.
机译:通过化学溶液沉积成功制备了C轴取向Bi_(3.25)La_(0.75)Ti_3O_(12)(BLT)铁电薄膜。通过X射线衍射可知,取向度随着烧结温度的升高而增加,同时,晶粒形态从等轴状变为板状。由于在650℃烧结的BLT薄膜的致密形态和c-择优取向的[Bi_2O_2]〜(2+)层,在室温下呈现最低的漏电流密度。另外,发现V〜(0.5)与log(J / T〜2)之间存在线性关系,表明BLT薄膜的漏电流行为符合肖特基发射模型。 P-E回路表明,c轴取向的BLT铁电薄膜呈现出低极化和小的矫顽场。

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