Electrodeposition of SmS optical thin films on ITO glass substrate

摘要

SmS optical thin films were deposited on the surface of ITO glass with an electrodeposition method using aqueous solution containing SmCl_3·6H_2O and Na_2S_2O_3·5H_2O. The phase composition was analyzed by X-ray diffraction (XRD) and microstructure of the film was characterized by atomic force microscope (AFM). It is showed that SmS thin film could be obtained in the solution with n(Sm)(S)= 1:4, pH=4.0 and annealing in Ar atmosphere at 200℃ for 0.5 h. The as-prepared thin films on the ITO glass exhibit a dense microstructure. The band gap of the thin film has been found to be 3.6 eV.