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Structural, optical and electrical properties of In doped CdO thin films for optoelectronic applications

机译:用于光电子应用的In掺杂CdO薄膜的结构,光学和电学性质

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Thin films of indium doped cadmium oxide were deposited on quartz substrate using pulsed laser deposition technique. The effect of growth temperature and partial oxygen pressure on structural, optical and electrical properties was studied. We find that the optical transparency of the films largely depends on the growth temperature, while partial oxygen pressure has virtually no effect on the transparency of the films. Electrical properties are found to be sensitive to both the growth temperature and oxygen pressure. It is observed that conductivity and carrier concentration decreases with temperature. The film grown at 200℃ under an oxygen pressure of 5.0×10~(-4) mbar shows high mobility (155 cm~2/V s), high carrier concentration (1.41 × 10~(21) cm~3), and low resistivity (2.86×10~(-5) Ω cm).
机译:使用脉冲激光沉积技术将掺杂铟的氧化镉薄膜沉积在石英基板上。研究了生长温度和氧分压对结构,光学和电学性质的影响。我们发现,膜的光学透明性很大程度上取决于生长温度,而部分氧气压力实际上对膜的透明性没有影响。发现电特性对生长温度和氧气压力均敏感。观察到电导率和载流子浓度随温度降低。在200℃,5.0×10〜(-4)mbar的氧气压力下生长的薄膜表现出高迁移率(155 cm〜2 / V s),高载流子浓度(1.41×10〜(21)cm〜3)和低电阻率(2.86×10〜(-5)Ωcm)

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