机译:激光化学气相沉积高速制备c轴取向YBa_2Cu_3O_(7-δ)薄膜
Institute for Materials Research, Tohoku University, Katahira 2-1-1, Sendai 980-8577, Japan;
Institute for Materials Research, Tohoku University, Katahira 2-1-1, Sendai 980-8577, Japan;
Institute for Materials Research, Tohoku University, Katahira 2-1-1, Sendai 980-8577, Japan;
Institute for Materials Research, Tohoku University, Katahira 2-1-1, Sendai 980-8577, Japan;
laser chemical vapor deposition; YBCO; high deposition rate;
机译:激光化学气相沉积法在MgO单晶衬底上高速生长YBa_2Cu_3O_(7-δ)膜并达到临界温度
机译:激光化学气相沉积法制备(100)CeO_2和(110)YBa_2Cu_3O_(7-δ)薄膜
机译:激光化学气相沉积法制备(100)CeO_2和(110)YBa_2Cu_3O_(7-δ)薄膜
机译:激光化学气相沉积的二氧化钛薄膜的高速制备
机译:通过脉冲激光沉积和化学气相沉积合成新型材料:第一部分:氮化碳薄膜的能量沉积和稳定性。第二部分:一维材料和装置的催化生长。
机译:193 nm ArF受激准分子激光在激光辅助等离子体增强SiNx的化学气相沉积中的作用以进行低温薄膜封装
机译:激光化学气相沉积法制备富TiO2的Ba-Ti-O厚膜