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Structural, optical and electrical characterization of ZnO:Ga thin films for organic photovoltaic applications

机译:用于有机光伏应用的ZnO:Ga薄膜的结构,光学和电学表征

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摘要

Gallium-doped zinc oxide (ZnO:Ga) films were prepared on glass substrates by RF magnetron sputtering. The effect of growth temperature on microstructure, optical and electrical properties of the films was investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), UV-visible spectrophotometer and four-point probe. The results show that all the films are polycrystalline and (002) oriented, and that the growth temperature significantly affects the microstructure and optoelectrical properties of the films. The film deposited at 670K has the largest grain size of 71.9nm, the lowest resistivity of 8.3×10~(-4)Ω·cm and the highest figure of merit of 2.1 × 10~(-2) Ω~(-1). Furthermore, the optical energy gaps and optical constants were determined by optical characterization methods. The dispersion behavior of the refractive index was also studied using the Sellmeir's dispersion model and the oscillator parameters of the films were obtained.
机译:通过射频磁控溅射在玻璃基板上制备了掺杂镓的氧化锌(ZnO:Ga)薄膜。通过X射线衍射(XRD),扫描电子显微镜(SEM),紫外可见分光光度计和四点探针研究了生长温度对薄膜微观结构,光学和电学性质的影响。结果表明,所有的薄膜都是多晶的并且是(002)取向的,并且生长温度显着影响薄膜的微观结构和光电性能。以670K沉积的薄膜最大晶粒尺寸为71.9nm,最低电阻率为8.3×10〜(-4)Ω·cm,最高品质因数为2.1×10〜(-2)Ω〜(-1)。 。此外,通过光学表征方法确定光学能隙和光学常数。还使用Sellmeir色散模型研究了折射率的色散行为,并获得了薄膜的振荡器参数。

著录项

  • 来源
    《Materials Letters》 |2011年第22期|p.3234-3236|共3页
  • 作者

    Zhong Zhi You; Gu Jin Hua;

  • 作者单位

    College of Electronic Information Engineering, South-Central University for Nationalities (SCUN), Wuhan 430074, People's Republic of China;

    Center of Computing and Experimenting, South-Central University for Nationalities (SCUN), Wuhan 430074, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    thin films; semiconductors; microstructure; optical properties;

    机译:薄膜;半导体;微观结构光学性质;

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