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Effect of growth parameters on photocatalytic properties of CuO nanowires fabricated by direct oxidation

机译:生长参数对直接氧化法制备的CuO纳米线光催化性能的影响

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摘要

CuO nanowires were grown on Cu substrate by direct oxidation method. Different growth temperatures from 400 to 600 ℃ were investigated in order to find optimum growth conditions. The results showed that annealing the substrate at 400 ℃ for 4 h in air is suitable for CuO nanowire growth with average diameter of about 50 nm. However, annealing the substrate at 500 ℃ results in dense growth and relatively aligned nanowires. The alignment of nanowires improves by annealing at 600 ℃ but the denseness of nanowires re-duces. The photocatalytic activities of CuO nanowires were studied by photocatalytic degradation of Congo red dye using a homemade photoreactor. The nanowires grown at 500 ℃ revealed the best photocatalytic performance.
机译:通过直接氧化法在Cu衬底上生长CuO纳米线。为了找到最佳生长条件,研究了400至600℃的不同生长温度。结果表明,在空气中400℃下退火4 h适于CuO纳米线的生长,平均直径约为50 nm。但是,在500℃下对基板进行退火会导致致密生长和相对排列的纳米线。在600℃退火可以改善纳米线的排列,但降低了纳米线的密度。通过使用自制的光反应器对刚果红染料进行光催化降解,研究了CuO纳米线的光催化活性。在500℃下生长的纳米线表现出最好的光催化性能。

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