The effect of electrochemical conditions on morphology and properties of Bi_2Se_3 thick films by electrodeposition

摘要

Electrodeposition of Bi_2Se_3 thick films on ITO-coated glass in a nitric acid solution bath was investigated. The electrodeposition kinetics and the influence of electrodeposition conditions on the composition, crystallographic structure, and microstructure of the films were studied. The mechanisms of deposition and nucleation were discussed. In addition, the thermoelectric properties were studied. The results show that the as-deposited films were pure Bi_2Se_3 films. The 2:3 stoichiometric ratio of the deposits were further verified by EDS quantitative analysis. The P-type semiconductors were confirmed by the Seebeck coefficient measurement. Also, the power factors, 46.65 and 52.57 μW/(m K~2) of the as-deposited films were obtained by properties measurement.