首页> 外文期刊>Materials Letters >Structural, microstructural, optical and electrical properties of (Pb,Ba,Sr)TiO_3 films growth on conductive LaNiO_3-coated LaAO_3(100) and Pt/Ti/SiO_2/Si substrates
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Structural, microstructural, optical and electrical properties of (Pb,Ba,Sr)TiO_3 films growth on conductive LaNiO_3-coated LaAO_3(100) and Pt/Ti/SiO_2/Si substrates

机译:(Pb,Ba,Sr)TiO_3薄膜在导电LaNiO_3涂层LaAO_3(100)和Pt / Ti / SiO_2 / Si衬底上生长的结构,微结构,光学和电学性质

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摘要

The ferroelectric and dielectric properties of lead barium strontium titanate (PBST) thin films are investigated on different bottom electrode and substrate such as Pt, LaNiO_3 and Pt/Ti/SiO_2/Si, LaAlO_3(100), respectively. X-ray diffraction results indicate that the PBST and LaNiO_3 films on LaAlO_3(100) single crystal substrate are highly (100)-oriented whereas the PBST films on Pt/Ti/SiO_2/Si are polycrystalline. The results indicate strong effects of bottom electrode on the dielectric permittivity and tunability of the PBST films. The dielectric permittivity and tunability for the highly (100)-oriented PBST films on LaNiO_3/LaAlO_3(100) structure were 1238% and 65%, respectively, at 100 kHz, while PBST films prepared on Pt/Ti/SiO_2/Si substrate, showed a dielectric permittivity of 520 and tunability of 47%, at 100 kHz. A slight shift of the phase transition temperature to lower temperatures was observed for highly (100)-oriented films in comparison to the polycrystalline films. Electrical properties should depend strongly on orientation and bottom electrode, which is reflected in our experimental observations.
机译:研究了钛酸钡锶锶(PBST)薄膜在不同的底部电极和基底(例如Pt,LaNiO_3和Pt / Ti / SiO_2 / Si,LaAlO_3(100))上的铁电和介电性能。 X射线衍射结果表明,LaAlO_3(100)单晶衬底上的PBST和LaNiO_3膜是高度(100)取向的,而Pt / Ti / SiO_2 / Si上的PBST膜是多晶的。结果表明底部电极对PBST薄膜的介电常数和可调谐性有很大影响。 LaNiO_3 / LaAlO_3(100)结构上高度(100)取向的PBST薄膜的介电常数和可调性在100 kHz时分别为1238%和65%,而在Pt / Ti / SiO_2 / Si衬底上制备的PBST薄膜,在100 kHz时的介电常数为520,可调谐性为47%。与多晶膜相比,对于高度(100)取向的膜,观察到相变温度向较低温度的轻微变化。电学性能应主要取决于取向和底部电极,这在我们的实验观察中得到了反映。

著录项

  • 来源
    《Materials Letters》 |2014年第15期|93-96|共4页
  • 作者单位

    LIEC - Department of Chemistry, Universidade Federal de Sao Carlos, Via Washington Luiz, Km 235, P.O. Box 676, 13565-905 Sao Carlos, Sdo Paulo, Brazil;

    Department of Chemistry, Universidade Estadual Paulista - Unesp, P.O. Box 473, 17033-360 Bauru, Sao Paulo, Brazil;

    Department of Chemistry, Universidade Estadual Paulista - Unesp, P.O. Box 473, 17033-360 Bauru, Sao Paulo, Brazil;

    Department of Chemistry, Universidade Estadual Paulista - Unesp, P.O. Box 473, 17033-360 Bauru, Sao Paulo, Brazil;

    NanO LaB-Department of Physics, Universidade Federal de Sao Carlos, Via Washington Luiz, Km 235, P.O. Box 676, 13565-905 Sao Carlos, Sao Paulo, Brazil;

    LIEC - Department of Chemistry, Universidade Federal de Sao Carlos, Via Washington Luiz, Km 235, P.O. Box 676, 13565-905 Sao Carlos, Sdo Paulo, Brazil,Institute of Chemistry, Universidade Estadual Paulista-Unesp, Araraquara, Sao Paulo, Brazil;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Thin films; Ferroelectric; Texture; Chemical solution deposition;

    机译:薄膜;铁电;质地;化学溶液沉积;

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