首页> 外文期刊>Journal of Applied Physics >Ferroelectric properties of Pb_xSr_(1-x)TiO_3 and its compositionally graded thin films grown on the highly oriented LaNiO_3 buffered Pt/Ti/SiO_2/Si substrates
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Ferroelectric properties of Pb_xSr_(1-x)TiO_3 and its compositionally graded thin films grown on the highly oriented LaNiO_3 buffered Pt/Ti/SiO_2/Si substrates

机译:Pb_xSr_(1-x)TiO_3及其在高取向LaNiO_3缓冲Pt / Ti / SiO_2 / Si衬底上生长的成分渐变薄膜的铁电性能

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摘要

Thin films of ferroelectric Pb_xSr_(1-x)TiO_3 (PST) with x=0.3-0.7 and graded composition were fabricated on LaNiO_3 buffered Pt/Ti/SiO_2/Si substrates by a sol-gel deposition method. The thin films crystallized into a single perovskite structure and exhibited highly (100) preferred orientation after postdeposition annealing at 650 ℃. The grain size of PST thin films systematically decreased with the increase of Sr content. Dielectric and ferroelectric properties were investigated as a function of temperature, frequency, and dc applied field. Pb_(0.6)Sr_(0.4)TiO_3 films showed a dominant voltage dependence of dielectric constant with a high tunability in a temperature range of 25-230℃. The compositionally graded PST thin films with x=0.3-0.6 also showed the high tunability. The graded thin films exhibited a diffused phase transition accompanied by a diffused peak in the temperature variations of dielectric constants. This kind of thin films has a potential in a fabrication of a temperature stable tunable device.
机译:通过溶胶-凝胶沉积法在LaNiO_3缓冲的Pt / Ti / SiO_2 / Si衬底上制备了x = 0.3-0.7的铁电Pb_xSr_(1-x)TiO_3(PST)薄膜。薄膜结晶为单个钙钛矿结构,并在650℃后沉积退火后表现出高度(100)的优选取向。随着Sr含量的增加,PST薄膜的晶粒尺寸逐渐减小。研究了介电和铁电特性随温度,频率和直流施加场的变化。 Pb_(0.6)Sr_(0.4)TiO_3薄膜在25-230℃的温度范围内具有介电常数的主要电压依赖性,并且具有较高的可调谐性。 x = 0.3-0.6的成分分级的PST薄膜也显示出高可调性。梯度薄膜在介电常数的温度变化中表现出扩散的相变和扩散的峰值。这种薄膜在制造温度稳定的可调装置方面具有潜力。

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