机译:硒供应对单个四元靶溅射沉积Cu(In,Ga)Se_2前驱体硒化的影响
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University,Shanghai 200241, China,Shanghai Solar Energy Technology Co., Ltd., Shanghai 200241, China;
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University,Shanghai 200241, China;
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University,Shanghai 200241, China;
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University,Shanghai 200241, China;
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University,Shanghai 200241, China;
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University,Shanghai 200241, China;
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University,Shanghai 200241, China;
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University,Shanghai 200241, China;
CIGS; Sputtering; Solar energy materials; Thin films;
机译:通过单步硒化溅射沉积的Cu-In-Ga-Se前驱体层制备的无Ga偏析的Cu(In,Ga)Se_2薄膜
机译:硒化参数对用Cu-In-Ga,Cu-In_2Se_3或Cu-Ga-In_2Se_3靶溅射沉积的Cu(In,Ga)Se_2薄膜生长特性的影响以及随后的550-700℃硒化程序
机译:后处理对使用四元单靶的射频磁控溅射溅射Cu(In,Ga)Se_2薄膜的性能的影响
机译:通过用单铜(In,Ga)Se_2和Cu-Ga-In_2Se_3靶溅射沉积Cu(族,Ga)Se_2膜和随后的硒化程序
机译:混合金属/金属硒化物前体的硒化形成硒化铜(铟,镓)。
机译:磁控溅射参数和W膜前驱体的应力状态对快速硒化对WSe2层织构的影响
机译:通过溅射和共蒸发沉积的Cu(In,Ga)Se_2薄膜的强度,刚度和微观结构