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机译:通过热退火从溅射沉积的Fe-Si-O非晶薄膜中析出的ε-Fe_2O_3的微波吸收
Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan;
Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan;
Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan;
National Institute of Advanced Industrial Science and Technology, Hokkaido 2-17-2-1, Tsukisamu-Higashi, Toyohira-ku, Sapporo 062-8517, Japan;
Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan;
Thin films; Sputtering; Electronic paramagnetic resonance (EPR); Optical properties;
机译:射频磁控溅射沉积非晶膜后退火制备的YIG(Y_3Fe_5O_(12))薄膜的磁性
机译:射频溅射沉积非晶Co(Zr,Nb)薄膜退火后应力和矫顽力的变化
机译:反应性离子束溅射沉积非晶态Cr-Zr-O薄膜中热诱导形成亚稳态纳米复合材料
机译:金/二氧化硅靶标溅射面积比的影响Au纳米粒子分散在非晶硅介电膜中的结构和光学吸收性能
机译:通过反应溅射沉积的光学模型非化学计量的非晶氧化铝薄膜
机译:快速热退火用于射频磁控溅射沉积的高质量ITO薄膜
机译:通过在室温下通过RF磁控溅射沉积的层的热退火获得的氧化钒薄膜