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The influence of long-term annealing at room temperature on creep behaviour of ECAP-processed copper

机译:室温下长期退火对ECAP处理铜蠕变行为的影响

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Present work investigates the effect of long-term annealing at low homologous temperature (similar to 0.22 T-m) on creep behaviour of pure copper (99.99%) processed by equal-channel angular pressing (ECAP). Coarse-grained pure copper was processed by 1 and 8 ECAP passes at room temperature. The ECAP-processed specimens were annealed at room temperature for 3 years. Microstructures of ECAP-processed specimens and their room temperature-annealed states were investigated by electron back scatter diffraction (EBSD) technique. Tensile tests were performed at room temperature under constant rate and at 373 Kin creep under constant load. It was found that long-term annealing at room temperature led to occurrence of large grains in microstructure which influenced the strength. The influence grew with number of ECAP passes.
机译:目前的工作研究了在低同源温度(类似于0.22 T-m)下长期退火对等通道角压(ECAP)处理的纯铜(99.99%)蠕变行为的影响。粗晶粒纯铜在室温下经过1和8次ECAP处理。将经ECAP处理的样品在室温下退火3年。通过电子背散射衍射(EBSD)技术研究了经ECAP处理的样品的显微组织及其室温退火状态。拉伸试验在室温下以恒定速率进行,在373 Kin蠕变下以恒定载荷进行。发现在室温下长期退火导致在组织中出现大晶粒,这影响了强度。影响随着ECAP次数的增加而增加。

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