Corrigendum to 'A simple route to deposit SiO_2 film with resistivity >10~9 Ω ·μm' [Mater. Lett. 211 (2018) 277-280]

著录项

• 来源
  《Materials Letters》 |2018年第15期|399-399|共1页
• 作者

  Dengyao Wang; Jindong Liu; Zhixuan Lv; Hualong Tao; Yunxian Cui; Hualin Wang; Shimin Liu; Chaoqian Liu; Nan Wang; Weiwei Jiang; Weiping Chai; Wanyu Ding;

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• 作者单位

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

  Dalian Jiaotong University;

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• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

• 入库时间 2022-08-17 13:18:06