机译:沉积温度和基底对溅射CCTO薄膜的微观结构和光学性能的影响
School of Materials and Mineral Resources Engineering, Universiti Sains Malaysia, Engineering Campus;
School of Materials and Mineral Resources Engineering, Universiti Sains Malaysia, Engineering Campus;
School of Electrical and Electronic Engineering, Universiti Sains Malaysia, Engineering Campus;
Center for Nanoscience and Technology, Institute of Science and Technology, Jawaharlal Nehru Technological University Hyderabad;
School of Materials and Mineral Resources Engineering, Universiti Sains Malaysia, Engineering Campus;
CCTO; Thin film; Sputtering; Optical properties;
机译:退火温度对溅射CCTO薄膜结构,形貌,光学性能和电阻率的影响
机译:反应溅射沉积氧化物薄膜:溅射功率和衬底温度对微观结构,形态和电性能的影响
机译:衬底温度对溅射纳米粒子V_2O_5薄膜的微观结构,电学和光学性质的影响
机译:基质温度对氮杂目标DC磁控溅射的铝锌薄膜微观结构和性能的影响
机译:氢退火和衬底温度对射频溅射氧化锌薄膜性能的影响
机译:ZnF2掺杂的ZnO靶在不同溅射衬底温度下沉积F掺杂的ZnO透明薄膜
机译:基质温度效应通过磁控溅射沉积制备的(Si,Al)/ A-C:H膜的微观结构和性质
机译:衬底对金属有机化学气相沉积制备的外延pbTiO(sub 3)薄膜的结构和光学性质的影响