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首页> 外文期刊>Materials & design >Highly textured ZnO thin films: An economical fabrication, doping by Mn~(2+) and Sn~(2+) and approachment for optical devices
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Highly textured ZnO thin films: An economical fabrication, doping by Mn~(2+) and Sn~(2+) and approachment for optical devices

机译:高纹理的ZnO薄膜:经济的制造,Mn〜(2+)和Sn〜(2+)的掺杂以及光学器件的接近

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Fabrication of high quality zinc oxide thin films and analysis on its physical, chemical properties have applications in opto-electronic devices, UV laser, microelectronics and micro-machining schemes. Highly textured ZnO thin film with a preferred (002) orientation was prepared by two-stage chemical deposition (TSCD) using an aqueous solution containing zinc complex on a soda-lime glass substrate. From the results obtained, it can be shown that the preferred orientations of the film microcrystal changes with the doping process. The film was characterized by X-ray diffraction (XRD), SEM, EDAX, optical technique, Fourier transform infrared spectroscopy (FTIR) in order to qualify its suitability for application in commercial devices. Effect of number of dipping on growth rate and properties of the undoped and doped-thin film was investigated. XRD patterns revealed the formation of polycrystalline textured thin films containing nano-grains. The chemical compositions of the thin films were determined by EDAX and FTIR methods. SEM reveals the presence of uniform adherent thin film. Increasing in grain size (R_x) of undoped and doped thin films were observed, while increasing the number of dipping. Optimized films allowed a 96 percent average transmission in the visible range. The mean band gap measured from the transmission spectrums of the undoped samples was 3.25 eV. The transmission curves of doped samples fluctuated with increasing the wavelength and this is due to interference of the light in the film itself. Feasibility of the prepared films for application in optical and UV laser devices was assessed by optical systems.
机译:高质量氧化锌薄膜的制造以及其物理,化学性质的分析已应用于光电设备,紫外线激光,微电子学和微加工方案中。通过在钠钙玻璃衬底上使用含锌络合物的水溶液通过两步化学沉积(TSCD)来制备具有优选(002)取向的高织构化ZnO薄膜。从获得的结果可以看出,膜微晶的优选取向随掺杂工艺而变化。通过X射线衍射(XRD),SEM,EDAX,光学技术,傅里叶变换红外光谱(FTIR)对膜进行了表征,以证明其在商业设备中的适用性。研究了浸渍次数对未掺杂和掺杂的薄膜生长速率和性能的影响。 XRD图谱揭示了含有纳米晶粒的多晶织构薄膜的形成。通过EDAX和FTIR方法确定薄膜的化学组成。 SEM显示出均匀粘附的薄膜的存在。观察到未掺杂和掺杂的薄膜的晶粒尺寸(R_x)增加,同时浸入次数增加。经过优化的胶卷在可见光范围内的平均透射率为96%。由未掺杂样品的透射光谱测得的平均带隙为3.25eV。掺杂样品的透射曲线随波长的增加而波动,这是由于薄膜本身中的光的干涉。通过光学系统评估了制备的薄膜用于光学和紫外线激光设备的可行性。

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