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Chemically deposited (100)-oriented BaTiO_3 films with highly concentrated solution using high crystallinity BaTiO_3 as a buffer layer

机译:使用高结晶度BaTiO_3作为缓冲层的高浓度溶液化学沉积(100)取向的BaTiO_3膜

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BaTiO_3 films with thickness of ~1 μm were prepared by chemical solution deposition on LaNiO_3/Pt/TiO_x/SiO_2/Si substrate with a thin highly (100)-oriented and high crystallinity BaTiO_3 thin film (~140 nm) as a buffer layer. The BaTiO_3 films prepared by using a 0.5 mol/L solution have high crystallinity and still show (100) preferred orientation. The electrical properties of the (100)-oriented BaTiO_3 films prepared by this process have been studied. A dielectric constant of ~910 and a loss tangent of ~3.5% (1 kHz) were obtained. The remanent polarization (2 P_r) and coercive field (2 E_c) are 4.0 μC/cm~2 and 35 kV/cm, respectively.
机译:通过化学溶液沉积在LaNiO_3 / Pt / TiO_x / SiO_2 / Si衬底上,制备了厚度约为1μm的BaTiO_3薄膜,该衬底具有薄的高度(100)取向和高结晶度的BaTiO_3薄膜(〜140 nm)作为缓冲层。通过使用0.5 mol / L溶液制备的BaTiO_3膜具有高结晶度,并且仍显示(100)较好的取向。研究了通过该方法制备的(100)取向BaTiO_3薄膜的电性能。介电常数约为910,损耗角正切约为3.5%(1 kHz)。剩余极化(2 P_r)和矫顽场(2 E_c)分别为4.0μC/ cm〜2和35 kV / cm。

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