Development of Nano-Precision SynerGistic Finishing Process of ELID-Grinding and MRF for Silicon Mirror

摘要

In this paper, we proposed a synergistic finishing process integrated MRF and ELID grinding and applied this method to nano-precision finishing of silicon wafer. ELID grinding, as pre-finishing, was employed to obtain high efficiency and higher form accuracy. MRF, as the final finishing, was used for improve furthermore surface quality and figure accuracy. Several sets of finishing experiments for silicon mirror have been performed to verify obtainable form accuracy and surface roughness by use of this new synergistic process. Form accuracy of the 69nm peak-to-valley and surface micro-roughness less than 10 Angstrom were produced in high efficiency.