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Surface interactions between nanodiamonds and glass in magnetorheological finishing (MRF).

机译:纳米金刚石与玻璃在磁流变整理(MRF)中的表面相互作用。

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摘要

Magnetorheological finishing (MRF) is a deterministic sub-aperture polishing process. The process uses a magnetorheological (MR) fluid that consists of micron-sized, spherical, magnetic carbonyl iron (CI) particles, non-magnetic polishing abrasives, water and stabilizers. Material removal occurs when the CI and non-magnetic polishing abrasives shear material off the surface being polished.;In this work we focus on building a better understanding of the MRF process. Material removal is possible using a non-magnetic polishing abrasive free MR fluid. We study how this occurs and how removal changes with the addition of non-magnetic polishing abrasives. Specifically we study nanodiamonds in the MR fluid. Nanodiamonds can be engineered to achieve varying properties that allow us to learn more about the MRF process.;We introduce a new MRF material removal rate model. This model contains terms for the near surface mechanical properties of glass, drag force, polishing abrasive size and concentration, chemical durability of the glass, MR fluid pH and the glass composition. We validate individual terms in our model separately and then compare the entire model to an existing MRF material removal model. All of our experimental data were obtained using nanodiamond MR fluids and a set of six optical glasses.;We discuss the role of nanodiamonds in the polishing zone by examining the residual surface texture inside MRF spots. We show evidence that the CI particles in the abrasive free MR fluid remove material with a micro-gouging mechanism and, as nanodiamonds are added to the system, the mechanism changes to a micro-lateral-fracture mechanism, which is more efficient in removing material. Finally, we modify a conventional model for surface roughness for use with MRF.
机译:磁流变精加工(MRF)是确定性的小孔抛光工艺。该工艺使用的磁流变(MR)流体由微米大小的球形球形羰基铁磁性(CI)颗粒,非磁性抛光磨料,水和稳定剂组成。当CI和非磁性抛光磨料将要抛光的表面上的材料剪切掉时,就会发生材料去除。;在这项工作中,我们着重于更好地理解MRF工艺。使用非磁性抛光无磨蚀MR流体可以去除材料。我们研究了这种情况的发生,以及添加非磁性抛光剂后去除方式的变化。具体而言,我们研究了MR流体中的纳米金刚石。可以对纳米金刚石进行工程处理,以实现各种特性,从而使我们可以了解有关MRF工艺的更多信息。我们引入了新的MRF材料去除率模型。该模型包含以下术语:玻璃的近表面机械性能,阻力,抛光磨料的尺寸和浓度,玻璃的化学耐久性,MR流体的pH值和玻璃成分。我们分别验证模型中的各个术语,然后将整个模型与现有的MRF材料去除模型进行比较。我们所有的实验数据都是使用纳米金刚石MR流体和一组六副光学玻璃获得的。我们通过检查MRF点内的残留表面纹理来讨论纳米金刚石在抛光区中的作用。我们显示的证据表明,无磨蚀性MR流体中的CI颗粒通过微气刨机理去除了材料,并且随着向系统中添加纳米金刚石,该机理变成了微侧向断裂机理,这在去除材料方面更加有效。最后,我们修改了用于MRF的表面粗糙度的常规模型。

著录项

  • 作者

    DeGroote, Jessica Erin.;

  • 作者单位

    University of Rochester.;

  • 授予单位 University of Rochester.;
  • 学科 Physics Optics.
  • 学位 Ph.D.
  • 年度 2007
  • 页码 224 p.
  • 总页数 224
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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