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机译:椭圆形中子聚焦镜的数控局部湿法刻蚀
Research Center for Ultra-precision Science and Technology, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
Research Center for Ultra-precision Science and Technology, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
Research Center for Ultra-precision Science and Technology, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
J-PARC Center, Japan Atomic Energy Agency, Tokai-mura, Ibaraki 319-1195, Japan;
J-PARC Center, Japan Atomic Energy Agency, Tokai-mura, Ibaraki 319-1195, Japan;
J-PARC Center, Japan Atomic Energy Agency, Tokai-mura, Ibaraki 319-1195, Japan;
aspherical mirror; elliptical mirror; local wet etching; etching; figuring; neutron optics; ultraprecision machining;
机译:一维数控局部湿法刻蚀椭圆形硬X射线聚焦镜
机译:数控局部湿蚀刻低压抛光非球面中子聚焦镜制造工艺的发展
机译:离子束溅射沉积通过数控局部湿法刻蚀制备的高反射率(m = 4)椭圆中子聚焦超镜
机译:椭圆形中子聚焦镜的数控局部湿法刻蚀
机译:通过聚焦离子束诱导的选择性混合和湿法化学蚀刻形成光通道波导:设计,制造和表征。
机译:基于四个变形镜的可变数值孔径聚焦光学系统的近衍射极限X射线聚焦
机译:中子聚焦椭圆镜基板通过数值控制的局部湿法蚀刻
机译:聚焦离子束注入和湿法刻蚀制备可见光致发光si微结构