机译:离子束溅射沉积通过数控局部湿法刻蚀制备的高反射率(m = 4)椭圆中子聚焦超镜
Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
J-PARC Center, Japan Atomic Energy Agency, Tokai-mura, Ibaraki, Japan;
J-PARC Center, Japan Atomic Energy Agency, Tokai-mura, Ibaraki, Japan;
J-PARC Center, Japan Atomic Energy Agency, Tokai-mura, Ibaraki, Japan;
neutron supermirror; local wet etching; ion beam sputtering; elliptical mirror; focusing;
机译:椭圆形中子聚焦镜的数控局部湿法刻蚀
机译:一维数控局部湿法刻蚀椭圆形硬X射线聚焦镜
机译:数控局部湿蚀刻低压抛光非球面中子聚焦镜制造工艺的发展
机译:利用数控局部湿法刻蚀制造的聚焦中子束的毫米厚椭圆形超镜堆叠镜装置
机译:通过聚焦离子束诱导的选择性混合和湿法化学蚀刻形成光通道波导:设计,制造和表征。
机译:通过原子层沉积和聚焦离子束铣削加工的多层菲涅耳波带片有效聚焦8 keV X射线
机译:中子聚焦椭圆镜基板通过数值控制的局部湿法蚀刻
机译:聚焦离子束注入和湿法刻蚀制备可见光致发光si微结构