机译:数控局部湿蚀刻低压抛光非球面中子聚焦镜制造工艺的发展
Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
J-PARC Center, Japan Atomic Energy Agency, Japan;
J-PARC Center, Japan Atomic Energy Agency, Japan;
J-PARC Center, Japan Atomic Energy Agency, Japan;
Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, Yamadaoka 2-1, Suita, Osaka 565-0871, Japan;
neutron supermirror; local wet etching; ion beam sputtering; elliptical mirror; focusing;
机译:椭圆形中子聚焦镜的数控局部湿法刻蚀
机译:一维数控局部湿法刻蚀椭圆形硬X射线聚焦镜
机译:局部湿法刻蚀制备超精密毫米厚椭圆形中子聚焦镜基板
机译:用数控局部湿法刻蚀制作超精密非球面聚焦镜
机译:通过聚焦离子束诱导的选择性混合和湿法化学蚀刻形成光通道波导:设计,制造和表征。
机译:高剪切湿造粒和辊压缩工艺开发的控制策略通过设计使用综合质量制备组合药物
机译:中子聚焦椭圆镜基板通过数值控制的局部湿法蚀刻
机译:聚焦离子束注入和湿法刻蚀制备可见光致发光si微结构