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Fast neutron irradiation effects in n-GaN

机译:n-GaN中的快速中子辐照效应

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摘要

The electrical properties and deep level spectra in undoped n-GaN films irradiated by fast neutrons are reported. The electron removal rate was ~5 cm~(-1), and the dominant deep states introduced by neutron damage were electron traps with activation energy of 0.75 eV. For high doses of 1.7 X 10~(17)-10~(18) cm~(-2) the material becomes semi-insulating n-type with the Fermi level pinned near E_c-0.85 eV. Deep level spectra are dominated by electron traps with activation energy of 0.75 eV, close to the energy of the Fermi level pinning in heavily irradiated material. Neutron irradiation also introduces a high density of centers giving rise to strong persistent photocapacitance. The observed phenomena are explained under the assumption that the dominant defects in neutron irradiated GaN are disordered regions produced by high-energy recoil atoms.
机译:报告了快速中子辐照的未掺杂n-GaN薄膜的电学性质和深能级光谱。电子去除速率为〜5 cm〜(-1),中子损伤引入的主要深层态为活化能为0.75 eV的电子陷阱。对于1.7 X 10〜(17)-10〜(18)cm〜(-2)的高剂量,材料变为半绝缘的n型,费米能级固定在E_c-0.85 eV附近。深能级谱由活化能为0.75 eV的电子陷阱控制,接近于强辐照材料中费米能级固定的能量。中子辐照还引入了高密度的中心,从而产生了强大的持久光电容。在假设中子辐照的GaN的主要缺陷是由高能反冲原子产生的无序区域的前提下解释了观察到的现象。

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