Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters

摘要

Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for achieving arbitrary, nanoscale features, over large areas without the use of costly step-and-repeat UV lithography tools. One requirement for NIL is to eliminate adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter. Previous work on thick (> 100 nm) diamondlike carbon (DLC) layers indicates that fluorinated DLC (F-DLC) provides a durable antiwear, antistick layer. In this work, a process for depositing an ultrathin layer of F-DLC is shown for SiO_2 based imprinters.